US PATENT SUBCLASS 216 / 47
.~ Mask is multilayer resist

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

41  DF  MASKING OF A SUBSTRATE USING MATERIAL RESISTANT TO AN ETCHANT (I.E., ETCH RESIST) {9}
47.~ Mask is multilayer resist

DEFINITION

Classification: 216/47

Mask is multilayer resist:

(under subclass 41) Process of using an etch resist comprising plural layers.