US PATENT SUBCLASS 216 / 45
.~ Mask is reusable (i.e., stencil)

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

41  DF  MASKING OF A SUBSTRATE USING MATERIAL RESISTANT TO AN ETCHANT (I.E., ETCH RESIST) {9}
45.~ Mask is reusable (i.e., stencil)

DEFINITION

Classification: 216/45

Mask is reusable (i.e., stencil):

(under subclass 41) Process using a prefabricated stencil or mask which may be reused in the subsequent etching of another substrate.