US PATENT SUBCLASS 216 / 44
.~ Mechanically forming pattern into a resist

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

41  DF  MASKING OF A SUBSTRATE USING MATERIAL RESISTANT TO AN ETCHANT (I.E., ETCH RESIST) {9}
44.~ Mechanically forming pattern into a resist

DEFINITION

Classification: 216/44

Mechanically forming pattern into a resist:

(under subclass 41) Process directed to the forming of a

pattern into the etch resist by mechanical means, e.g., cutting, punching, scribing using a stylus, etc.

SEE OR SEARCH THIS CLASS, SUBCLASS:

52+, for a separate step of mechanically shaping, deforming, or abrading of a substrate.