US PATENT SUBCLASS 216 / 42
.~ Resist material applied in particulate form or spray

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

41  DF  MASKING OF A SUBSTRATE USING MATERIAL RESISTANT TO AN ETCHANT (I.E., ETCH RESIST) {9}
42.~ Resist material applied in particulate form or spray

DEFINITION

Classification: 216/42

Resist material applied in particulate form or spray:

(under subclass 41) Process wherein the masking is applied by a coating process involving the application of particulate material or by a spray coating procedure.