US PATENT SUBCLASS 204 / 298.13
.~.~.~.~ Target composition


Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use



204 /   HD   CHEMISTRY: ELECTRICAL AND WAVE ENERGY

193  DF  APPARATUS {5}
298.01  DF  .~ Coating, forming or etching by sputtering {2}
298.02  DF  .~.~ Coating {13}
298.12  DF  .~.~.~ Specified target particulars {1}
298.13.~.~.~.~ Target composition


DEFINITION

Classification: 204/298.13

Target composition:

(under subclass 298.12) Apparatus wherein the composition of the target is specified.