US PATENT SUBCLASS 204 / 298.12
.~.~.~ Specified target particulars

Current as of: June, 1999
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204 /   HD   CHEMISTRY: ELECTRICAL AND WAVE ENERGY

193  DF  APPARATUS {5}
298.01  DF  .~ Coating, forming or etching by sputtering {2}
298.02  DF  .~.~ Coating {13}
298.12.~.~.~ Specified target particulars {1}
298.13  DF  .~.~.~.~> Target composition

DEFINITION

Classification: 204/298.12

Specified target particulars:

(under subclass 298.02) Apparatus wherein a significant target feature or particular target construction is specified.

(1) Note. The target usually forms a part of or is associated with a cathode electrode.