US PATENT SUBCLASS 204 / 192.23
.~.~.~.~.~ Silicon containing


Current as of: June, 1999
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204 /   HD   CHEMISTRY: ELECTRICAL AND WAVE ENERGY

*  DD  PROCESSES AND PRODUCTS {7}
192.1  DF  .~ Coating, forming or etching by sputtering {3}
192.12  DF  .~.~ Glow discharge sputter deposition (e.g., cathode sputtering, etc.) {3}
192.15  DF  .~.~.~ Specified deposition material or use {10}
192.22  DF  .~.~.~.~ Insulator or dielectric {1}
192.23.~.~.~.~.~ Silicon containing


DEFINITION

Classification: 204/192.23

Silicon containing:

(under subclass 192.22) Processes wherein the material comprises silicon.