| 118 / | HD | COATING APPARATUS |
| 715 | DF | GAS OR VAPOR DEPOSITION {9} |
| 722 | DF | .~ With treating means (e.g., jarring) {2} |
| 723 R | DF | .~.~ By creating electric field (e.g., gas activation, plasma, etc.) {8} |
| 723 VE | ![]() | .~.~.~ Vacuum evaporation means within deposition chamber (e.g., activated reactive evaporation, etc.) {2} |
| 723 CB | DF | .~.~.~.~> Ion cluster beam |
| 723 EB | DF | .~.~.~.~> Electron beam evaporator |