US PATENT SUBCLASS 118 / 723 CB
.~.~.~.~ Ion cluster beam

Current as of: June, 1999
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118 /   HD   COATING APPARATUS

715  DF  GAS OR VAPOR DEPOSITION {9}
722  DF  .~ With treating means (e.g., jarring) {2}
723 R  DF  .~.~ By creating electric field (e.g., gas activation, plasma, etc.) {8}
723 VE  DF  .~.~.~ Vacuum evaporation means within deposition chamber (e.g., activated reactive evaporation, etc.) {2}
723 CB.~.~.~.~ Ion cluster beam

Unofficial Alpha Subclasses: R VE CB EB MP FE FI MW ME MR MA AN HC DC ER IR

DEFINITION

Classification: 118/723

By means creating additional electric field:

(under subclass 722) Apparatus wherein the means performing the additional conditioning creates an electric field which acts on the base or coating material.