US PATENT SUBCLASS 118 / 715
GAS OR VAPOR DEPOSITION

Current as of: June, 1999
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118 /   HD   COATING APPARATUS

715GAS OR VAPOR DEPOSITION {9}
716  DF  .~> Means to coat or impregnate particulate matter
717  DF  .~> Object embedded in particulate mass
718  DF  .~> Running length work
719  DF  .~> Multizone chamber
720  DF  .~> Having means to expose a portion of a substrate to coating medium {1}
722  DF  .~> With treating means (e.g., jarring) {2}
726  DF  .~> Crucible or evaporator structure {1}
728  DF  .~> Work support {1}
733  DF  .~> Chamber seal

DEFINITION

Classification: 118/715

GAS OR VAPOR DEPOSITION:

(under the class definition) Apparatus wherein a coating material which is in the form of either the third state of matter, i.e., gaseous, or the transition between the second

and third states of matter, i.e., vaporous, is condensed upon and forms a deposit of a base.

(1) Note. The mere atomization of a liquid coating material by the influx of a pressurized gas thereby forming a fine mist is not included here. See Class 118, subclasses 300+.

SEE OR SEARCH CLASS

117, Single-Crystal, Oriented-Crystal, and Epitaxy Growth Processes; Non-Coating Apparatus Therefor, for processes and non-coating apparatus for growing therein-defined single-crystal of all types of materials, including inorganic or organic, especially

84+, for processes of vapor phase epitaxy corresponding to the vapor phase epitaxy apparatus found in Class 118.