US PATENT SUBCLASS 117 / 97
.~.~.~ Material removal (e.g., etching, cleaning, polishing)

Current as of: June, 1999
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117 /   HD   SINGLE-CRYSTAL, ORIENTED-CRYSTAL, AND EPITAXY GROWTH PROCESSES; NON-COATING APPARATUS THEREFOR

84  DF  FORMING FROM VAPOR OR GASEOUS STATE (E.G., VPE, SUBLIMATION) {8}
88  DF  .~ With decomposition of a precursor (except impurity or dopant precursor) composed of diverse atoms (e.g., CVD) {8}
94  DF  .~.~ With pretreatment or preparation of a base (e.g., annealing) {2}
97.~.~.~ Material removal (e.g., etching, cleaning, polishing)

DEFINITION

Classification: 117/97

Material removal (e.g., etching, cleaning, polishing):

(under subclass 94) Subject matter in which the pretreatment involves removing material from the base*.

(1) Note. Examples of subject matter proper for this subclass are: uniform material removal from the base* surface, such as etching or non-uniform removal such as exposing a seed* region (e.g., by removing a masking material).