US PATENT SUBCLASS 117 / 94
.~.~ With pretreatment or preparation of a base (e.g., annealing)

Current as of: June, 1999
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117 /   HD   SINGLE-CRYSTAL, ORIENTED-CRYSTAL, AND EPITAXY GROWTH PROCESSES; NON-COATING APPARATUS THEREFOR

84  DF  FORMING FROM VAPOR OR GASEOUS STATE (E.G., VPE, SUBLIMATION) {8}
88  DF  .~ With decomposition of a precursor (except impurity or dopant precursor) composed of diverse atoms (e.g., CVD) {8}
94.~.~ With pretreatment or preparation of a base (e.g., annealing) {2}
95  DF  .~.~.~> Coating (e.g., masking, implanting) {1}
97  DF  .~.~.~> Material removal (e.g., etching, cleaning, polishing)

DEFINITION

Classification: 117/94

With pretreatment or preparation of a base (e.g., annealing):

(under subclass 88) Subject matter in which a base* is prepared or is subject to treatment prior to single-crystal* growth.

(1) Note. Pretreatment includes: cleaning such as etching; heating (e.g., to evolve impurities); or coating (e.g., masking), including when such coating is a separate layer in the final product or is removed in a subsequent step or is one which is absorbed into the final product (e.g., an adherence enhancing coating).

(2) Note. Placement here is proper for claims directed to preparation of the base* when combined with a step of single-crystal* growth.

(3) Note. Not included as pretreatment are: merely heating up to operating temperature, or moving or positioning substrate or apparatus.

SEE OR SEARCH THIS CLASS, SUBCLASS:

89+, for processes which include a change in growth-influencing parameter during crystal growth; e.g., making superlattices, layers, junction.

101, for specified arrangement of or crystallos:graphic orientation of the substrate.

106, for similar processes involving pretreatment or preparation of the substrate and not involving a decomposition reaction of the precursor*.