US PATENT SUBCLASS 117 / 92
.~.~.~ Using an energy beam or field, a particle beam or field, or a plasma (e.g., ionization, PECVD, CBE, MOMBE, RF induction, laser)

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


117 /   HD   SINGLE-CRYSTAL, ORIENTED-CRYSTAL, AND EPITAXY GROWTH PROCESSES; NON-COATING APPARATUS THEREFOR

84  DF  FORMING FROM VAPOR OR GASEOUS STATE (E.G., VPE, SUBLIMATION) {8}
88  DF  .~ With decomposition of a precursor (except impurity or dopant precursor) composed of diverse atoms (e.g., CVD) {8}
89  DF  .~.~ Including change in a growth-influencing parameter (e.g., composition, temperature, concentration, flow rate) during growth (e.g., multilayer or junction or superlattice growing) {4}
92.~.~.~ Using an energy beam or field, a particle beam or field, or a plasma (e.g., ionization, PECVD, CBE, MOMBE, RF induction, laser)

DEFINITION

Classification: 117/92

Using an energy beam or field, a particle beam or field, or a plasma (e.g., ionization, PECVD, CBE, MOMBE, RF induction, laser):

(under subclass 89) Subject matter in which the process utilizes a particle beam or an energy beam or a particle field or an energy field or a plasma.

(1) Note. For example: laser, electron, chemical, or molecular beams; plasma; RF, magnetic, or electric fields; ionization.

(2) Note. The decomposition reaction may be related to or unrelated to the energy beam or field, particle beam or field, or plasma.

SEE OR SEARCH THIS CLASS, SUBCLASS:

90, for processes in which the substrate is pretreated with an energy or particle beam or field, or plasma.

103, for similar processes in which there is no change in a growth-influencing parameter.

SEE OR SEARCH CLASS 204, Chemistry: Electrical and Wave Energy, for processes of forming a single crystal by a method set forth in that class definition and as restricted in Class 204,

157.15, (9) Note. Thus, Class 204 is proper for single crystal growth processes which involve glow discharge, plasma torch, electrolysis, electrophoresis, sputtering, or vacuum arc discharge.

427, Coating Processes, for processes of depositing a coating other than single-crystal* (e.g., polycrystalline or amorphous) on a substrate, except as specifically provided for elsewhere, especially

457+, for processes of coating combined with direct application of electrical, magnetic, wave, or particle energy (e.g., subclasses 497, 509, 523+, 569+, 580, 582+, 585+, and 593) and subclasses 248.1+ for coating by vapor, gas, or smoke.