US PATENT SUBCLASS 528 / 80
.~.~ With reactant compound containing at least two -C-C(=X)-X-C groups and which compound is devoid of C-NH, C=NH or C-N(H)-H groups

Current as of: June, 1999
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528 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {23}
44  DF  .~ FROM REACTANT HAVING AT LEAST ONE -N=C=X GROUP (WHEREIN X IS A CHALCOGEN ATOM) AS WELL AS PRECURSORS THEREOF, E.G., BLOCKED ISOCYANATE, ETC. {17}
80.~.~ With reactant compound containing at least two -C-C(=X)-X-C groups and which compound is devoid of C-NH, C=NH or C-N(H)-H groups {3}
81  DF  .~.~.~> Reactant compound which contains at least two -C-C(=X)-X-C groups contains three or more XH groups
82  DF  .~.~.~> Reactant which contains at least two -C-C(=X)-X-C groups contains tertiary nitrogen atom
83  DF  .~.~.~> Reactant which contains at least two -C-C(=X)-X-C groups has been derived from only a dicarboxylic acid or derivative and only a dihydric alcohol or alcoholate derivative

DEFINITION

Classification: 528/80

(under subclass 44) Subject matter wherein a material containing two or more -N=C=X (X is chalcogen) groups is reacted with a compound having two or more groups and which compound is devoid of any C-NH-, C=NH, or C-NH2 groups.

(1) Note. In all cases the functional group must be bonded directly to a carbon atom. A compound having a single carbon atom which is bonded to two or more groups would meet the requirements of this subclass.

SEE OR SEARCH THIS CLASS, SUBCLASS:

84, for (a) polymers derived from a reactant having two or more -N=C=X groups which reactant contains two or more groups and which contains at least one C-NH-, C-NH2[end subscrpt], or C=NH group, or (b) a polymer derived from a reactant having two or more -N=C=X groups and a reactant having a group.