US PATENT SUBCLASS 528 / 44
.~ FROM REACTANT HAVING AT LEAST ONE -N=C=X GROUP (WHEREIN X IS A CHALCOGEN ATOM) AS WELL AS PRECURSORS THEREOF, E.G., BLOCKED ISOCYANATE, ETC.

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528 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {23}
44.~ FROM REACTANT HAVING AT LEAST ONE -N=C=X GROUP (WHEREIN X IS A CHALCOGEN ATOM) AS WELL AS PRECURSORS THEREOF, E.G., BLOCKED ISOCYANATE, ETC. {17}
45  DF  .~.~> From at least one blocked -N=C=X group
48  DF  .~.~> Process of polymerizing in the presence of a specified material other than reactant {5}
59  DF  .~.~> From N=C=X reactant having at least two -C-NH-C(=X)- groups {3}
67  DF  .~.~> From two or more reactants containing -N=C=X groups
68  DF  .~.~> With organic compound reactant containing at least two NH, HNH or =NH groups and wherein the reactant composition is devoid of -C-XH, -C(=X)XH or anhydride
69  DF  .~.~> Reactant contains a single -N=C=X group
70  DF  .~.~> Reactant contains a fluorine atom
71  DF  .~.~> Reactant contains at least one salt group, e.g., quaternary ammonium salt, etc.
72  DF  .~.~> Reactant contains at least one phosphorus atom
73  DF  .~.~> Reactant contains at least one heterocyclic ring
74  DF  .~.~> Reactant contains at least one bridged- or fused-ring system
74.5  DF  .~.~> Reactant which is a fatty acid glycerol ester, a fatty acid or salt derived from a naturally occurring glyceride, tall oil, or a fatty acid derived from tall oil
75  DF  .~.~> Reactant contains at least one ethylenically unsaturated group
76  DF  .~.~> With ether or thioether compound containing at least two -C-X-C- groups {3}
80  DF  .~.~> With reactant compound containing at least two -C-C(=X)-X-C groups and which compound is devoid of C-NH, C=NH or C-N(H)-H groups {3}
84  DF  .~.~> With reactant containing at least two -C-C(=X)-X groups
85  DF  .~.~> With reactant containing at least two -XH groups

DEFINITION

Classification: 528/44

(under subclass 1) Subject matter under Class 520 ... involving polymers derived from a reactant containing a -N=C=X group wherein X is a chalcogen atom (i.e., O, S, Se, or Te) or processes of polymerizing; polymerizable compositions containing as a reactant a compound having the general formula R-N=C=X wherein X is a chalcogen or processes of preparing a polymerizable composition.

(1) Note. This subclass also provides for those functional derivatives of isocyanates which are generally known as blocked, masked, or hidden isocyanates. These materials are those which revert on heating to the -N=C=X group (e.g., urethanes or ureides of phenols, alkanols, lactams, oximes, etc.)

(2) Note. Where a -N=C=X group is produced by an in situ reaction or a decomposition reaction (other than blocked, masked, or hidden isocyanates), those patents have been placed as originals in subclasses which provide for the compound prior to its decomposition or on the basis of the reactants undergoing the in situ reaction (e.g., adiponitrile, carbonates, or oxalates).

(3) Note. Polonium is excluded from this subclass as being a chalcogen.

(4) Note. As used throughout this subclass any reference to X (e.g., -XH-C-XH, etc.) connotes oxygen, sulfur, selenium, or tellurium.

SEE OR SEARCH THIS CLASS, SUBCLASS:

370+, 480+, for processes of preparing a polymer not involving a chemical modification of the polymer, by the addition of a

material thereto, and for chemically modifying material other than the polymer. Subclasses 480+ also provide for processes of admixing with a broadly claimed nonreactant material.