US PATENT SUBCLASS 505 / 413
.~.~ Utilizing mask (e.g., photoresist, etc.)

Current as of: June, 1999
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505 /   HD   SUPERCONDUCTOR TECHNOLOGY: APPARATUS, MATERIAL, PROCESS

300  DF  PROCESSES OF PRODUCING OR TREATING HIGH TEMPERATURE (Tc GREATER THAN 30 K) SUPERCONDUCTOR MATERIAL OR SUPERCONDUCTOR CONTAINING PRODUCTS OR PRECURSORS THEREOF {24}
410  DF  .~ With material removal by etching, laser ablation, or mechanical abrasion {3}
413.~.~ Utilizing mask (e.g., photoresist, etc.)

DEFINITION

Classification: 505/413

Utilizing mask (e.g., photoresist, etc.):

(under subclass 410) Process wherein a shield is utilized during the etching process to protect at least a portion of a substrate from etchant, usually in a patterning operation.