US PATENT SUBCLASS 438 / FOR 389
.~ Of radiation resist layer (437/229)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 385  DF  INCLUDING COATING OR MATERIAL REMOVAL, E.G., ETCHING, GRINDING, ETC. (437/ 225) {9}
FOR 389.~ Of radiation resist layer (437/229)

DEFINITION

Classification: 438/FOR.389

Of radiation resist layer:

Foreign art collection for processes including coating or etching, or both steps of a resist layer which is affected by

electromagnetic radiation.