US PATENT SUBCLASS 438 / FOR 334
.~ To anneal (437/174)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 333  DF  APPLYING CORPUSCULAR OR ELECTROMAGNETIC ENERGY (437/173) {1}
FOR 334.~ To anneal (437/174)

DEFINITION

Classification: 438/FOR.334

To anneal:

Foreign art collection for processes for heat treating the material to obtain a desired result.