US PATENT SUBCLASS 438 / FOR 311
.~.~.~ Simultaneously (437/151)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 149  DF  INCLUDING FORMING A SEMICONDUCTOR JUNCTION (437/15) {7}
FOR 301  DF  .~ Diffusing a dopant (437/141) {17}
FOR 310  DF  .~.~ Plural dopants in same region, e.g., through same mask opening, etc. (437/150) {1}
FOR 311.~.~.~ Simultaneously (437/151)

DEFINITION

Classification: 438/FOR.311

Simultaneously:

Foreign art collection for processes wherein the multiple impurities are applied at the same time.