US PATENT SUBCLASS 438 / FOR 307
.~.~ Using multiple layered mask (437/147)

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 149  DF  INCLUDING FORMING A SEMICONDUCTOR JUNCTION (437/15) {7}
FOR 301  DF  .~ Diffusing a dopant (437/141) {17}
FOR 307.~.~ Using multiple layered mask (437/147) {1}
FOR 308  DF  .~.~.~> Having plural predetermined openings in master mask (437/148)

DEFINITION

Classification: 438/FOR.307

Using multiple layered mask:

Foreign art collection for processes involving use of a mask composed of plural layers.