438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
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FOR 149 | DF | INCLUDING FORMING A SEMICONDUCTOR JUNCTION (437/15) {7} |
FOR 294 |  | .~ By fusing dopant with substrate, e.g., alloying, etc. (437/134) {6} |
FOR 295 | DF | .~.~> Using flux (437/135) |
FOR 296 | DF | .~.~> Passing electric current through material (437/136) |
FOR 297 | DF | .~.~> With application of pressure to material during fusing (437/137) |
FOR 298 | DF | .~.~> Including plural controlled heating or cooling steps (437/138) |
FOR 299 | DF | .~.~> Including diffusion after fusion step (437/139) |
FOR 300 | DF | .~.~> Including additional material to improve wettability or flow characteristics (437/140) |