US PATENT SUBCLASS 438 / FOR 147
.~ By vapor phase surface reaction (437/13)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 144  DF  INCLUDING GETTERING (437/10) {3}
FOR 147.~ By vapor phase surface reaction (437/13)

DEFINITION

Classification: 438/FOR.147

By vapor phase surface reaction:

Foreign art collection for subject matter in which the substrate is treated with a reactive gas mixture which preferentially forms volatile compounds with the undesired impurities.