US PATENT SUBCLASS 438 / FOR 133
.~.~.~.~ Plural resist coating (156/661.11)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

983  DF  ZENER DIODES {1}
FOR 100  DF  .~ Etching of semiconductor precursor, substrates, and devices used in an electrical function (156/625.1) {17}
FOR 128  DF  .~.~ Differential etching of a substrate (156/654.1) {2}
FOR 132  DF  .~.~.~ Resist coating (156/659.11) {1}
FOR 133.~.~.~.~ Plural resist coating (156/661.11)

DEFINITION

Classification: 438/FOR.133

Plural resist coating:

Foreign art collection for processes wherein more than one coating, intended to protect at least a portion of the substrate from the action of an etchant, is applied.