US PATENT SUBCLASS 438 / FOR 120
.~.~ Etchant is a gas (156/646.1)

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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

983  DF  ZENER DIODES {1}
FOR 100  DF  .~ Etching of semiconductor precursor, substrates, and devices used in an electrical function (156/625.1) {17}
FOR 120.~.~ Etchant is a gas (156/646.1)

DEFINITION

Classification: 438/FOR.120

Etchant is a gas:

Foreign art collection for processes wherein the etchant is in a state of molecular dispersion when it contacts the substrate.