US PATENT SUBCLASS 438 / FOR 118
.~.~ Forming or increasing the size of an aperture (156/644.1)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

983  DF  ZENER DIODES {1}
FOR 100  DF  .~ Etching of semiconductor precursor, substrates, and devices used in an electrical function (156/625.1) {17}
FOR 118.~.~ Forming or increasing the size of an aperture (156/644.1)

DEFINITION

Classification: 438/FOR.118

Forming or increasing the size of an aperture:

Foreign art collection for processes wherein an etchant is applied to a substrate in such a manner that (a) a relatively small passage or opening is formed completely through the substrate, or (b) a previously existing small passage or opening in an substrate is enlarged by the action of the etchant.