US PATENT SUBCLASS 438 / FOR 115
.~.~ Projection of etchant against a moving substrate or controlling the angle or pattern of projected etchant (156/640.1)

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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

983  DF  ZENER DIODES {1}
FOR 100  DF  .~ Etching of semiconductor precursor, substrates, and devices used in an electrical function (156/625.1) {17}
FOR 115.~.~ Projection of etchant against a moving substrate or controlling the angle or pattern of projected etchant (156/640.1)

DEFINITION

Classification: 438/FOR.115

Projection of etchant against a moving substrate or controlling the angle or pattern of projected etchant:

Foreign art collection for processes wherein an etchant is transported through space by mechanical force and (a) brought

into contact with a substrate while the substrate is in motion, (b) the etchant is transported at a predetermined angle, or (c) the etchant is transported in a particular pattern.