US PATENT SUBCLASS 438 / FOR 103
.~.~ Altering the etchability of a substrate by alloying, diffusing, or chemical reacting (156/628.1)

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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

983  DF  ZENER DIODES {1}
FOR 100  DF  .~ Etching of semiconductor precursor, substrates, and devices used in an electrical function (156/625.1) {17}
FOR 103.~.~ Altering the etchability of a substrate by alloying, diffusing, or chemical reacting (156/628.1)

DEFINITION

Classification: 438/FOR.103

Altering the etchability of a substrate by alloying, diffusing, or chemical reacting:

Foreign art collection for processes wherein the manner in which a substrate is effected by an etchant is altered by contacting the substrate prior to etching with a material which (a) forms an alloy with, (b) diffuses into, or (c) chemically reacts with the substrate.