US PATENT SUBCLASS 438 / 8
.~.~ Chemical etching

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

5  DF  INCLUDING CONTROL RESPONSIVE TO SENSED CONDITION {3}
7  DF  .~ Optical characteristic sensed {1}
8.~.~ Chemical etching {1}
9  DF  .~.~.~> Plasma etching

DEFINITION

Classification: 438/8

Chemical etching:

(under subclass 7) Process having a step of chemically etching the semiconductor substrate in conjunction with the sensing of an optical property of the process or of the semiconductor device.