US PATENT SUBCLASS 438 / 798
.~ Ionized irradiation (e.g., corpuscular or plasma treatment, etc.)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

795  DF  RADIATION OR ENERGY TREATMENT MODIFYING PROPERTIES OF SEMICONDUCTOR REGION OF SUBSTRATE (E.G., THERMAL, CORPUSCULAR, ELECTROMAGNETIC, ETC.) {3}
798.~ Ionized irradiation (e.g., corpuscular or plasma treatment, etc.)

DEFINITION

Classification: 438/798

Ionized irradiation (e.g., corpuscular or plasma treatment, etc.):

(under subclass 795) Process wherein ionized radiation is applied to the semiconductor to modify the properties thereof.

SEE OR SEARCH THIS CLASS, SUBCLASS:

474, for a process of gettering a semiconductor substrate by the application of ionized irradiation thereto.

514, for a process for implanting an electrically active dopant into a semiconductive region of the substrate.