US PATENT SUBCLASS 438 / 762
.~.~ At least one layer formed by reaction with substrate

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

758  DF  COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE {6}
761  DF  .~ Multiple layers {2}
762.~.~ At least one layer formed by reaction with substrate

DEFINITION

Classification: 438/762

At least one layer formed by reaction with substrate:

(under subclass 761) Processes wherein at least one of the layers is formed by reacting an external agent with a constituent of the substrate to form a compound thereof.