US PATENT SUBCLASS 438 / 704
.~ Having liquid and vapor etching steps

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
704.~ Having liquid and vapor etching steps

DEFINITION

Classification: 438/704

Having liquid and vapor etching steps:

(under subclass 689) Processes having a liquid (i.e., wet) chemical etching step and a gaseous (i.e., dry) chemical etching step.

SEE OR SEARCH CLASS

216, Etching a Substrate: Processes,

57, for the combination of wet chemical etching with dry chemical etching upon a generic substrate.