US PATENT SUBCLASS 438 / 681
.~.~.~ Of organo-metallic precursor (i.e., MOCVD)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

584  DF  COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL {2}
597  DF  .~ To form ohmic contact to semiconductive material {24}
680  DF  .~.~ Utilizing chemical vapor deposition (i.e., CVD) {1}
681.~.~.~ Of organo-metallic precursor (i.e., MOCVD)

DEFINITION

Classification: 438/681

Of organo-metallic precursor (i.e., MOCVD):

(under subclass 680) Processes where the chemical vapor deposition process utilizes an organo-metallic compound.