US PATENT SUBCLASS 438 / 535
.~ By application of corpuscular or electromagnetic radiation (e.g., electron, laser, etc.)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

510  DF  INTRODUCTION OF CONDUCTIVITY MODIFYING DOPANT INTO SEMICONDUCTIVE MATERIAL {7}
535.~ By application of corpuscular or electromagnetic radiation (e.g., electron, laser, etc.) {1}
536  DF  .~.~> Recoil implantation

DEFINITION

Classification: 438/535

By application of corpuscular or electromagnetic radiation (e.g., electron, laser, etc.):

(under subclass 510) Process having a step of applying corpuscular or electromagnetic radiation to the semiconductor substrate to affect the incorporation of an electrically active dopant therein.

(1) Note. See herein for a process of implantation of dopant ions into nonsemiconductive regions of the substrate and subsequent diffusion into semiconductive regions thereof.