US PATENT SUBCLASS 438 / 466
DIRECT APPLICATION OF ELECTRICAL CURRENT

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

466DIRECT APPLICATION OF ELECTRICAL CURRENT {4}
467  DF  .~> To alter conductivity of fuse or antifuse element
468  DF  .~> Electromigration
469  DF  .~> Utilizing pulsed current
470  DF  .~> Fusion of semiconductor region

DEFINITION

Classification: 438/466

DIRECT APPLICATION OF ELECTRICAL CURRENT:

(under the class definition) Process including the step having an electric current come in direct contact with the semiconductor substrate (i.e., nonradiatively) to treat the same.

(1) Note. Per se (a) irradiation of ionized atoms or molecules to implant the same into a semiconductor material, (b) exposing a semiconductive substrate to a plasma or electron beam, or (c) electrochemical treatment of a semiconductive substrate, is not considered a direct application electrical treatment for this and indented subclasses.

SEE OR SEARCH THIS CLASS, SUBCLASS:

10, for a semiconductor manufacturing process including a step of measuring or testing of the process or of the substrate for feedback control of the manufacturing process.

17, for a semiconductor manufacturing process including a step of measuring or testing an electrical characteristic of the process or of the substrate.

88, for a process of making a device responsive to electromagnetic radiation having a step of directly applying electrical current.

101, for a process of manufacturing a point contact

semiconductive device having a step of directly applying electrical current. 103, for a process of manufacturing a device having a selenium or tellurium elemental semiconductive device including a step of directly applying electrical current.

292, for a process of making an insulated gate field effect transistor having a step of directly applying electrical current.

351, for a process of making a bipolar transistor having a step of directly applying electrical current.

SEE OR SEARCH CLASS

204, Chemistry: Electrical and Wave Energy, especially

192.1+, for processes of coating, forming, or etching by sputtering.

324, Electricity: Measuring and Testing, appropriate subclass for per se electrical testing (i.e., aging).