US PATENT SUBCLASS 438 / 401
.~ Having substrate registration feature (e.g., alignment mark)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

400  DF  FORMATION OF ELECTRICALLY ISOLATED LATERAL SEMICONDUCTIVE STRUCTURE {10}
401.~ Having substrate registration feature (e.g., alignment mark)

DEFINITION

Classification: 438/401

Having substrate registration feature (e.g., alignment mark):

(under subclass 400) Process wherein the process of forming electrical isolation utilizes an alignment feature formed on the semiconductive substrate or forms an alignment feature for subsequent use.