US PATENT SUBCLASS 430 / 326
.~.~.~ Pattern elevated in radiation unexposed areas

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
322  DF  .~ Forming nonplanar surface {3}
325  DF  .~.~ Post image treatment to produce elevated pattern {1}
326.~.~.~ Pattern elevated in radiation unexposed areas

DEFINITION

Classification: 430/326

Pattern elevated in radiation unexposed areas:

(under subclass 325) Processes wherein the imaged medium is treated to produce an image in the form of an elevated pattern in radiation unexposed areas of the medium, i.e., by removal of soluble material in radiation exposed areas of a radiation-sensitive layer.