US PATENT SUBCLASS 430 / 325
.~.~ Post image treatment to produce elevated pattern

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
322  DF  .~ Forming nonplanar surface {3}
325.~.~ Post image treatment to produce elevated pattern {1}
326  DF  .~.~.~> Pattern elevated in radiation unexposed areas

DEFINITION

Classification: 430/325

Post image treatment to produce elevated pattern:

(under subclass 322) Processes wherein the imaged medium is treated to produce an image in the form of raised pattern, e.g., by removal of soluble material in radiation unexposed areas of a radiation layer, etc.