US PATENT SUBCLASS 430 / 317
.~.~.~ Insulative or nonmetallic dielectric etched


Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use



430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
311  DF  .~ Making electrical device {3}
313  DF  .~.~ With formation of resist image, and etching of substrate or material deposition {5}
317.~.~.~ Insulative or nonmetallic dielectric etched


DEFINITION

Classification: 430/317

Insulative or nonmetallic dielectric etched:

(under subclass 313) Processes wherein the portion of the medium being removed is an insulative or dielectric (nonmetal) material.