US PATENT SUBCLASS 430 / 316
.~.~.~ Multiple etching of substrate

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
311  DF  .~ Making electrical device {3}
313  DF  .~.~ With formation of resist image, and etching of substrate or material deposition {5}
316.~.~.~ Multiple etching of substrate

DEFINITION

Classification: 430/316

Multiple etching of substrate:

(under subclass 313) Processes wherein portions of the medium are removed using more than one etching procedure.