US PATENT SUBCLASS 430 / 158
.~.~.~.~ Including subbing layer


Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141  DF  DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
154  DF  .~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}
155  DF  .~.~ Product with at least two named layers {5}
157  DF  .~.~.~ Diazonium compound containing layer {3}
158.~.~.~.~ Including subbing layer {3}
159  DF  .~.~.~.~.~> Silicon, nitrogen, or sulfur compound containing subbing layer
160  DF  .~.~.~.~.~> Polymer containing subbing layer
161  DF  .~.~.~.~.~> Acid, salt, or ester moiety ingredient containing subbing layer


DEFINITION

Classification: 430/158

Including subbing layer:

(under subclass 157) Products having a layer between base or support, and the radiation-sensitive layer.