US PATENT SUBCLASS 427 / 588
.~.~.~ Silicon or semiconductor material containing coating

Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
585  DF  .~ Chemical vapor deposition (e.g., electron beam or heating using IR, inductance, resistance, etc.) {2}
587  DF  .~.~ Resistance or induction heating {2}
588.~.~.~ Silicon or semiconductor material containing coating {1}
589  DF  .~.~.~.~> Silicon carbide

DEFINITION

Classification: 427/588

Silicon or semiconductor material containing coating:

(under subclass 587) Processes wherein coating matter applied to a substrate contains silicon or semiconductor material.

SEE OR SEARCH CLASS

438, Semiconductor Device Manufacturing: Process, particularly

788+, and 792+ for deposition of silicon oxide or silicon nitride, respectively, on a semiconductor substrate utilizing electromagnetic or wave energy.