US PATENT SUBCLASS 427 / 585
.~ Chemical vapor deposition (e.g., electron beam or heating using IR, inductance, resistance, etc.)

Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
585.~ Chemical vapor deposition (e.g., electron beam or heating using IR, inductance, resistance, etc.) {2}
586  DF  .~.~> Pyrolytic use of laser or focused light (e.g., IR, UV lasers to heat, etc.)
587  DF  .~.~> Resistance or induction heating {2}

DEFINITION

Classification: 427/585

Chemical vapor deposition (e.g., electron beam or heating using IR, inductance, resistance, etc.):

(under subclass 457) Processes wherein a vapor phase precursor decomposes either in a gas or on a substrate, which reaction is effected by electromagnetic, electrical, magnetic, or wave energy which results in a coated substrate.

(1) Note. Thermal chemical vapor deposition processes using infrared heating to effect or assist in effecting the chemical reaction are found here.

(2) Note. This subclass excludes processes wherein an infrared energy is utilized merely to vaporize the coating material, e.g., where no chemical reaction takes place, in a vapor deposition process.

(3) Note. Indirect heat transfer to a substrate as via convection is excluded from this and indented subclasses as a heat energy source.

SEE OR SEARCH THIS CLASS, SUBCLASS:

69, 99, 124, 166, and 248.1+, for vapor deposition processes which may include utilization of radiant heat.