US PATENT SUBCLASS 427 / 579-- .~.~.~ Silicon oxides or nitrides

US PATENT SUBCLASS 427 / 579
.~.~.~ Silicon oxides or nitrides

Current as of: June, 1999
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427 /	HD	COATING PROCESSES

457	DF	DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
569	DF	.~ Plasma (e.g., corona, glow discharge, cold plasma, etc.) {5}
578	DF	.~.~ Silicon containing coating material {1}
579		.~.~.~ Silicon oxides or nitrides

DEFINITION

Classification: 427/579

Silicon oxides or nitrides:

(under subclass 578) Processes wherein the silicon utilized in the coating material is silicon oxide or silicon nitride.

SEE OR SEARCH THIS CLASS, SUBCLASS:

577, for coating material containing silicon carbide.

SEE OR SEARCH CLASS

438, Semiconductor Device Manufacturing: Process, particularly

788+, and 792+ for deposition of silicon oxide or silicon nitride, respectively, on a semiconductor substrate utilizing electromagnetic or wave energy.