US PATENT SUBCLASS 427 / 573
.~.~.~ With heated substrate

Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
569  DF  .~ Plasma (e.g., corona, glow discharge, cold plasma, etc.) {5}
570  DF  .~.~ Utilizing plasma with other nonionizing energy sources {4}
573.~.~.~ With heated substrate

DEFINITION

Classification: 427/573

With heated substrate:

(under subclass 570) Processes wherein a substrate is heated using electrical or electromagnetic wave energy, including indirect heat as in the form of a susceptor.