US PATENT SUBCLASS 427 / 255.392
.~.~.~.~ Tungsten compound containing coating (e.g., tungsten silicide, etc.)

Current as of: June, 1999
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427 /   HD   COATING PROCESSES

248.1  DF  COATING BY VAPOR, GAS, OR SMOKE {9}
255.23  DF  .~ Mixture of vapors or gases (e.g., deposition gas and inert gas, inert gas and reactive gas, two or more reactive gases, etc.) utilized {5}
255.28  DF  .~.~ Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, CVD, etc.) {4}
255.39  DF  .~.~.~ Halogen or halogen compound containing reactant {3}
255.392.~.~.~.~ Tungsten compound containing coating (e.g., tungsten silicide, etc.)

DEFINITION

Classification: 427/255.392

Tungsten compound containing coating (e.g., tungsten silicide, etc.):

(under subclass 255.39) Process wherein the resulting coating contains tungsten as a compound.