US PATENT SUBCLASS 427 / 255.39
.~.~.~ Halogen or halogen compound containing reactant

Current as of: June, 1999
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427 /   HD   COATING PROCESSES

248.1  DF  COATING BY VAPOR, GAS, OR SMOKE {9}
255.23  DF  .~ Mixture of vapors or gases (e.g., deposition gas and inert gas, inert gas and reactive gas, two or more reactive gases, etc.) utilized {5}
255.28  DF  .~.~ Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, CVD, etc.) {4}
255.39.~.~.~ Halogen or halogen compound containing reactant {3}
255.391  DF  .~.~.~.~> Titanium compound containing coating (e.g., titanium carbonitride, titanium nitride, etc.)
255.392  DF  .~.~.~.~> Tungsten compound containing coating (e.g., tungsten silicide, etc.)
255.393  DF  .~.~.~.~> Silicon containing coating

DEFINITION

Classification: 427/255.39

Halogen or halogen compound containing reactant:

(under subclass 255.28) Process wherein halogen (i.e., fluorine, chlorine, bromine, iodine, or astatine), in compound or elemental form, is used as a reactant.

(1) Note. A halogen containing reaction may have the halogen as (a) part of the resultant coating, (b) part of reaction materials used to form the coating, or (c) part of reaction materials used to form other reactants.