US PATENT SUBCLASS 427 / 255.28
.~.~ Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, CVD, etc.)

Current as of: June, 1999
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427 /   HD   COATING PROCESSES

248.1  DF  COATING BY VAPOR, GAS, OR SMOKE {9}
255.23  DF  .~ Mixture of vapors or gases (e.g., deposition gas and inert gas, inert gas and reactive gas, two or more reactive gases, etc.) utilized {5}
255.28.~.~ Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, CVD, etc.) {4}
255.29  DF  .~.~.~> Inorganic oxygen, sulfur, selenium, or tellurium (i.e., chalcogen) containing coating (e.g., phosphosilicate, silicon oxynitride, etc.) {2}
255.38  DF  .~.~.~> Phosphorus or boron containing coating (e.g., aluminum boride, boron phosphide etc.)
255.39  DF  .~.~.~> Halogen or halogen compound containing reactant {3}
255.394  DF  .~.~.~> Nitrogen containing coating (e.g., metal nitride, etc.)

DEFINITION

Classification: 427/255.28

Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, CVD, etc.):

(under subclass 255.23) Process wherein all or any part of the mixture of vapors or gases is caused to react, resulting in the formation of a coating.