US PATENT SUBCLASS 395 / 500.2
DESIGN OF SEMICONDUCTOR MASK


Current as of: June, 1999
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395 /   HD   INFORMATION PROCESSING SYSTEM ORGANIZATION

500.2DESIGN OF SEMICONDUCTOR MASK {2}
500.21  DF  .~> Mesh generation
500.22  DF  .~> Pattern exposure


DEFINITION

Classification: 395/500.2

DESIGN OF SEMICONDUCTOR MASK:

(under the class definition) Subject matter comprising means or steps for planning or devising a template used for etching circuit pattern on semiconductor wafers.

SEE OR SEARCH THIS CLASS, SUBCLASS:

257, Active Solid-State Devices (e.g., Transistors, Solid-State Diodes), appropriate subclasses for detail structure of active solid-state devices.

364, Electrical Computers and Data Processing Systems, subclass 468.28 for computer-controlled semiconductor fabrication.

430, Radiation Imagery Chemistry: Process, Composition, or Product Thereof, subclass 5 for radiation masks used in radiation imaging of semiconductor devices.

438, Semiconductor Device Manufacturing: Process, appropriate subclasses for the process of manufacturing semiconductor devices.