US PATENT SUBCLASS 395 / 500.21
.~ Mesh generation


Current as of: June, 1999
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395 /   HD   INFORMATION PROCESSING SYSTEM ORGANIZATION

500.2  DF  DESIGN OF SEMICONDUCTOR MASK {2}
500.21.~ Mesh generation


DEFINITION

Classification: 395/500.21

Mesh generation:

(under subclass 500.2) Subject matter comprising means or steps for determining or approximating the surface contour of the mask by mathematical model or algorithm such as numerical analysis.

(1) Note. The shape or boundary of the mask is divided or segmented into rectangular, triangular, or polygon grids for approximation, for example, by differential equations algorithm.