US PATENT SUBCLASS 395 / 500.22
.~ Pattern exposure


Current as of: June, 1999
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395 /   HD   INFORMATION PROCESSING SYSTEM ORGANIZATION

500.2  DF  DESIGN OF SEMICONDUCTOR MASK {2}
500.22.~ Pattern exposure


DEFINITION

Classification: 395/500.22

Pattern exposure:

(under subclass 500.2) Subject matter including means or steps for tracing or drawing an electronic pattern on a semiconductor wafer or mask with particle beam.

(1) Note. Examples of particle beams are ion beams, electron beams, or e-beams.

SEE OR SEARCH CLASS

204, Chemistry: Electrical and Wave Energy,

298.01, 298.39 for coating, forming, or etching apparatus using atomic particles.

250, Radiant Energy,

491.1, 492.3 for irradiating object or material and the ion or electron beam irradiation, per se.